Array substrate, method of manufacturing the same and liquid crystal display apparatus having the same

ABSTRACT

An array substrate includes a transparent substrate, an organic insulation layer, a pixel electrode, a reflective layer, a light blocking pattern and a switching part. The transparent substrate includes a reflective window that reflects an ambient light and a transmissive window that transmits an artificial light. The organic insulation layer disposed over the transparent substrate becomes thinner gradually at a boundary between the transmissive window and the reflective window. The pixel electrode is formed in the transmissive region. The reflective layer is disposed over the organic insulation layer of the reflective window. The light blocking pattern is disposed at the boundary between the transmissive and reflective windows to prevent a light leakage. The switching part is electrically connected to the pixel electrode to apply an image signal to the pixel electrode. Therefore, a light leakage occurring at boundary is prevented by the light blocking pattern.

CROSS-REFERENCE TO RELATED APPLICATIONS

This application is a continuation of U.S. application Ser. No.10/840,107 filed May 6, 2004, now U.S. Pat. No. 7,209,199 which claimspriority to and the benefit of Korean Patent Application No. 2003-37231filed on Jun. 10, 2003, the contents of which are herein incorporated byreference in their entireties.

BACKGROUND OF THE INVENTION

1. Field of the Invention

The present invention relates to an array substrate, a method ofmanufacturing the array substrate and a liquid crystal display apparatushaving the array substrate. More particularly, the present inventionrelates to a transmissive and reflective type array substrate forpreventing light leakages, a method of manufacturing the array substrateand a liquid crystal display apparatus having the array substrate.

2. Description of the Related Art

Generally, a photosensitive material for patterning an oxidation layer,a metal layer, a semiconductor layer, etc. is widely used in a processof manufacturing a semiconductor device or a liquid crystal displayapparatus.

The liquid crystal display apparatus includes an array substrate havinga plurality of thin film transistors, a color filter substrate having aplurality of color filters, and a liquid crystal layer interposedbetween the array substrate and the color filter substrate.

The liquid crystal display apparatus may be classified into atransmissive type liquid crystals display apparatus that displays imagesby using an artificial light, a reflective type liquid crystal displayapparatus that displays images by using an ambient light, and atransmissive and reflective type liquid crystal display apparatus thathas merits of the transmissive type liquid crystal display apparatus andthe reflective type liquid crystal display apparatus.

FIG. 1 is a schematic cross-sectional view showing a conventional arraysubstrate for a transmissive and reflective type liquid crystal displayapparatus.

Referring to FIG. 1, a conventional array substrate for a transmissiveand reflective type liquid crystal display apparatus includes atransparent substrate 10, a data line 20, an organic insulation layer30, a pixel electrode 40 and a reflective layer 50. An image signal istransferred via the data line 20. The organic insulation layer 30 isformed on the transparent substrate 10, such that the organic insulationlayer 30 defines a reflective region R and a transmissive region T. Thepixel electrode 40 is formed on the organic insulation layer 30, and thepixel electrode 40 receives the image signal. The reflective layer 50 isformed on the pixel electrode 40 or on the organic insulation layer 30to reflect an ambient light.

The organic insulation layer 30 is formed in the reflective region R,but not formed in the transmissive region T. Therefore, a light Algenerated from a backlight passes through the transmissive region T, andan ambient light NI is reflected on the reflective layer 50. Liquidcrystal molecules are disposed over the pixel electrode 40 and thereflective layer 50.

Characteristics of displayed images depend on an arrangement of theliquid crystal molecules, and response of the liquid crystal moleculesare changed in accordance with electric fields that are applied to theliquid crystal molecules. Therefore, a process of manufacturing theliquid crystal display apparatus includes an alignment process foruniform alignment of liquid crystal molecules.

The alignment process includes a coating process for coating analignment film, and a rubbing process for aligning the liquid crystalmolecules according to a pretilt angle. When the rubbing process is notuniform throughout the alignment film, the alignment of the liquidcrystal molecules is irregular to induce a locally irregular arrangementof the liquid crystal molecules. In case of the transmissive andreflective type liquid crystal display apparatus, above describedproblems become more serious.

As shown in FIG. 1, liquid crystal molecules are arranged in accordancewith a rubbing direction Rd, such that the liquid crystal molecules forma pretilt angle. However, even when rubbing grooves are uniformly formedvia the rubbing process, the pretilt angle of first and second inclinedportions (or boundary regions) ‘A’ and ‘B’ is not uniform. That is,liquid crystal molecules of the reflective region R and the transmissiveregion T maintain a uniform pretilt angle, but pretilt angle of liquidcrystal molecules disposed in the first and second inclined portions ‘A’and ‘B’ is not identical with the uniform pretilt angle due to aninclination. As a result, a light generated from a backlight assemblyleaks through the first and second inclined portions ‘A’ and ‘B’ toinduce an inferiority of a display quality.

FIG. 2 is a schematic plan view of the conventional transmissive andreflective type liquid crystal display apparatus showing a light leakagecaused by an abnormal pretilt angle. In FIG. 2, rectangular shape thatis not hatched represents the transmissive region ‘T’ of FIG. 1, and‘CNT’ represents a contact hole through which drain electrode of aswitching device and a pixel electrode are electrically connected toeach other.

As explained above, a light leaks through a boundary region ‘E’ of thetransmissive region ‘T’ and the reflective region ‘R’. Especially, thelight leaks much at the boundary region ‘E’ between the reflectiveregion and the transmissive region arranged in that sequence along arubbing direction Rd.

Furthermore, when the transmissive and reflective type liquid crystaldisplay panel is used as a touch screen panel, a display defect causedby moisture may occur as well as the light leakage. When the touchscreen panel is compressed, electric fields of the boundary regionbecomes unstable to induce an abnormal arrangement of the liquid crystalmolecules. Therefore, a fatal light leakage occurs, so that anafterimage remains at the boundary region and moisture gathers at thesurface of the touch screen panel.

As described above, the light leakage caused by an abnormal arrangementof liquid crystal molecules disposed in a boundary region between areflective region and a transmissive region comes out as problems.

SUMMARY OF THE INVENTION

The present invention provides an array substrate for preventing a lightleakage that occurs at a boundary region between a transmissive regionand a reflective region.

The present invention also provides a method of manufacturing the arraysubstrate.

The present invention also further provides a liquid crystal displayapparatus having the array substrate.

In an exemplary array substrate according to the invention, the arraysubstrate includes a transparent substrate, an organic insulation layer,a pixel electrode, a reflective layer, a light blocking pattern and aswitching part. The transparent substrate includes a reflective windowthat reflects an ambient light and a transmissive window that transmitsan artificial light. The organic insulation layer is disposed over thetransparent substrate. The organic insulation layer becomes thinnergradually at a boundary between the transmissive window and thereflective window. The pixel electrode is formed in the transmissiveregion. The reflective layer is disposed over the organic insulationlayer of the reflective window. The light blocking pattern is disposedat the boundary between the transmissive window and the reflectivewindow to prevent a light leakage. The switching part is electricallyconnected to a gate line, a source line and the pixel electrode to applyan image signal to the pixel electrode.

In an exemplary method of forming an array substrate, a first thin filmis formed on a transparent substrate. The first thin film is patternedto form a gate line, a gate electrode protruded from the gate line and alight blocking pattern. A gate insulation layer and a semiconductorlayer are formed on the transparent substrate having the light blockingpattern. A second thin film is formed on the semiconductor layer. Thesecond thin film is patterned to form a source line, a source electrodeprotruded from the source line and a drain electrode that is spacedapart from the source electrode. The gate, source and drain electrodesforms a switching device. An organic insulation layer is coated on thetransparent substrate having the switching device formed thereon, and aportion of the organic insulation layer is removed to form a contacthole through which the drain electrode is exposed, and a transmissivewindow such that a side portion of the transmissive window overlaps withthe light blocking pattern. A pixel electrode that is electricallyconnected to the drain electrode via the contact hole is formed over theorganic insulation layer. Then, a reflective layer is formed over theorganic insulation layer to form a reflective window.

In an exemplary liquid crystal display apparatus according to theinvention, the liquid crystal display apparatus includes an uppersubstrate, a lower substrate and a liquid crystal layer. The uppersubstrate has a color filter. The lower substrate faces the uppersubstrate, and the lower substrate includes a pixel portion, an organicinsulation layer and a light blocking pattern. The pixel portion has areflective window that reflects an ambient light and a transmissivewindow that transmits an artificial light. The organic insulation layerhas an inclined portion that is disposed at a boundary of the reflectivewindow and the transmissive window. The light blocking pattern isdisposed at the boundary to intercept a portion of the artificial lightthat leaks from the boundary. The liquid crystal layer is interposedbetween the upper substrate and the lower substrate.

According to the present invention, a light leakage at the boundary ofthe reflective window and the transmissive window is prevented toimprove a display quality.

BRIEF DESCRIPTION OF THE DRAWINGS

The above and other features and advantage points of the presentinvention will become more apparent by describing in detailed exemplaryembodiments thereof with reference to the accompanying drawings, inwhich:

FIG. 1 is a schematic cross-sectional view showing a conventional arraysubstrate for a transmissive and reflective type liquid crystal displayapparatus;

FIG. 2 is a schematic plan view of the conventional transmissive andreflective type liquid crystal display apparatus showing a light leakagecaused by an abnormal pretilt angle.

FIG. 3 is a schematic cross-sectional view showing an array substrate ofa transmissive and reflective type liquid crystal display apparatusaccording to an exemplary embodiment of the present invention;

FIG. 4 is a plan view showing a transmissive and reflective type liquidcrystal display apparatus according to a first exemplary embodiment ofthe present invention;

FIG. 5 is a cross-sectional view taken along a line A-A′ of FIG. 4;

FIGS. 6A to 6D are layouts showing a process of manufacturing thetransmissive and reflective type liquid crystal display apparatus ofFIG. 4;

FIG. 7 is a plan view showing an array substrate of a transmissive andreflective type liquid crystal display apparatus according to a secondexemplary embodiment of the present invention;

FIG. 8 is a cross-sectional view taken along a line B-B′ of FIG. 7;

FIGS. 9A to 9D are layouts showing a process of manufacturing thetransmissive and reflective type liquid crystal display apparatus ofFIG. 7;

FIG. 10 is a plan view showing a transmissive and reflective type liquidcrystal display apparatus according to a third exemplary embodiment ofthe present invention;

FIG. 11 is a cross-sectional view taken along a line C-C′ of FIG. 10;

FIGS. 12A to 12D are layouts showing a process of manufacturing thetransmissive and reflective type liquid crystal display apparatus ofFIG. 10;

FIG. 13 is a plan view showing a transmissive and reflective type liquidcrystal display apparatus according to a fourth exemplary embodiment ofthe present invention; and

FIG. 14 is a cross-sectional view taken along a line D-D′ of FIG. 13.

DESCRIPTION OF PREFERRED EMBODIMENTS

Hereinafter the preferred embodiments of the present invention will bedescribed in detail with reference to the accompanied drawings.

FIG. 3 is a schematic cross-sectional view showing an array substrate ofa transmissive and reflective type liquid crystal display apparatusaccording to an exemplary embodiment of the present invention.

Referring to FIG. 3, an array substrate of a transmissive and reflectivetype liquid crystal display apparatus according to an exemplaryembodiment of the present invention includes a transparent substrate 110having a pixel portion and a switching portion, a data wiring 120 fortransferring a pixel signal to the switching portion (not shown), anorganic insulation layer 130 for defining a reflective region ‘R’ and atransmissive region ‘T’, a pixel electrode 140 receiving the pixelsignal from the switching portion, and a reflective layer 150 formed onthe pixel electrode 140 and the organic insulation layer 130.

The pixel portion is a minimum unit for displaying an image, and thepixel portion includes the reflective region ‘R’ where an ambient lightNI is reflected and the transmissive region ‘T’ where a light generatedfrom a backlight assembly is transmitted. The switching device controlsthe pixel signal that is to be applied to the pixel electrode. A lightblocking pattern 112 is formed on the transparent substrate 110. Aninsulation layer 114 is formed on the transparent substrate 110 havingthe light blocking pattern 112 formed thereon, such that the insulationlayer 114 covers the transparent 110 and the light blocking pattern 112.

The organic insulation layer 130 has a column shape having apredetermined width and height. A portion of the organic insulationlayer 130 is removed to form a transmissive window corresponding to thetransmissive region ‘T’. The pixel electrode 150 is formed on theorganic insulation layer 130, and the reflective electrode 150 is formedon the pixel electrode 150 of the reflective region ‘R’. The organicinsulation layer of first and second boundary regions ‘A’ and ‘B’ areinclined. The first boundary region ‘A’ corresponds to a region disposedbetween the reflective region ‘R’ and the transmissive region ‘T’arranged in that sequence along a rubbing direction Rd, and the secondboundary region ‘B’ corresponds to a region disposed between thetransmissive region ‘T’ and the reflective region ‘R’ arranged in thatsequence along the rubbing direction Rd. When a rubbing process iscompleted, liquid crystal molecules 160 are arranged toward the rubbingdirection forming a pretilt angle with respect to the pixel electrode140 and the reflective layer 150. Therefore, liquid crystal molecules ofthe first boundary region ‘A’ lie with respect to the transparentsubstrate 110, and the liquid crystal molecules of the second boundaryregion ‘B’ erect with respect to the transparent substrate 110.

The pixel electrode 140 is transparent, so that the light Al generatedfrom the backlight assembly may pass through the pixel electrode 140 toadvance toward upper substrate (not shown). The ambient light NI arrivesat the reflective layer 150 from the upper substrate, and reflected onthe reflective layer 150 to advance toward the upper substrate.

For example, the light blocking pattern 112 covers an orthogonalprojection of the first boundary region ‘A’. The light blocking pattern112 may be extended toward the transmissive region ‘T’, such that thelight blocking pattern 112 invades the transmissive region ‘T’.Therefore, the light generated from the backlight assembly that is topass through the first boundary region ‘A’ is blocked by the lightblocking pattern 112 to prevent a light leakage.

The light blocking pattern 112 may be formed to cover an orthogonalprojection of the second boundary region ‘B’. Therefore, a light leakageoccurring at the second boundary region ‘B’ is prevented. When therubbing direction is reversed, the pretilt angle is changed inaccordance with the rubbing direction. In FIG. 3, the organic insulationlayer 130 is not formed in the transmissive region ‘T’. However, theorganic insulation layer 130 may be formed in the transmissive region‘T’ to have a thickness that is thinner than the organic insulationlayer 130 of the reflective region ‘R’. In FIG. 3, the first and secondboundary regions ‘A’ and ‘B’ is not vertical. However, even when thefirst and second boundary regions ‘A’ and ‘B’ are vertical, a lightleakage occurs. Therefore, the light blocking layer 130 may be formed inthe first and second boundary regions ‘A’ and ‘B’.

FIG. 4 is a plan view showing a transmissive and reflective type liquidcrystal display apparatus according to a first exemplary embodiment ofthe present invention.

Referring to FIG. 4, a liquid crystal display apparatus according to afirst exemplary embodiment of the present invention includes a pluralityof gate lines 209, a plurality of source lines 217, a thin filmtransistor TFT as switching device, a storage capacitor CST, a lightblocking pattern 230, a pixel electrode 250, a reflective layer 260formed in a reflective region. The reflective layer 260 definesreflective and transmissive regions.

The gate lines 209 are formed on a transparent substrate. The gate lines209 are extended in a horizontal direction, and the gate lines 209 arearranged in a vertical direction. The source lines 217 are extended inthe vertical direction, and the gate lines 209 are arranged in thehorizontal direction. Therefore, neighboring gate lines 209 andneighboring source lines 217 define a pixel region. The pixel regionincludes a thin film transistor TFT and a storage capacitor CST. Thepixel region includes a transmissive region 245 and a reflective region.A light generated from a backlight assembly (not shown) passes throughthe transmissive region 245, and an ambient light is reflected on thereflective region. For example, the transmissive region 245 has arectangular shape, and arranged in parallel with the source lines 217.The transmissive region 245 has a first side portion 245 a, a secondside portion 245 b facing the first side portion 245 a, a third sideportion 245 c and a fourth side portion 245 d facing the third sideportion 245 c. The first and second side portions 245 a and 245 b aredisposed at first and second boundaries ‘A’ and ‘B’, respectively. Thefirst boundary ‘A’ corresponds to a region between the reflective regionand the transmissive region 245 in that sequence along the rubbingdirection Rd. The second boundary ‘B’ corresponds to a region betweenthe transmissive region 245 and the reflective region in that sequencealong the rubbing direction Rd. The third and fourth side portions 245 cand 245 d are substantially parallel with the gate lines 209. The thinfilm transistor TFT includes a gate electrode line 210 protruded fromthe gate lines 209, a source electrode line 218 protruded from thesource lines 217, and a drain electrode line 219 that is spaced apartfrom the source electrode line 218.

The storage capacitor CST is defined by a first storage electrode line220 and a second storage electrode line 222 that is formed via a processof forming the source electrode lines 217.

The light blocking pattern 230 is formed via a process of forming thegate lines 209, such that a length of the light blocking pattern 230 islarger than a length of the first side portion 245 a of the transmissiveregion 245, and a width of the light blocking pattern 230 is wider thana width of the source lines 217.

The pixel electrode 250 comprises an optically transparent andelectrically conductive material, for example, such as indium tin oxide(ITO), indium zinc oxide (IZO), etc. The pixel electrode 250 is formedin the pixel region that is defined by the neighboring gate lines andneighboring source lines. The pixel electrode 250 is electricallyconnected to the drain electrode line 219 via the contact hole 243, sothat a pixel voltage is applied to the pixel electrode 250 via the drainelectrode line 219.

The reflective layer 260 is formed on the pixel electrode 250 to form areflective region (or reflective window). A portion of the reflectivelayer 260 is removed to form the transmissive region (or transmissivewindow) 245 through which a light generated from a backlight assemblypasses. A portion of the light blocking pattern 230 is exposed via thetransmissive region 245. That is, the portion of the light blockingpattern 230 invades the first side portion 245 a of the transmissiveregion 245 to prevent a light leakage of the first side portion 245 a ofthe transmissive region 245.

For example, when the rubbing direction Rd is from a left side to aright side, as shown in FIG. 4, a first amount of light leaks throughthe first side portion 245 a of the transmissive region 245, and asecond amount of light leaks through the second side portion 245 b incase of a conventional array substrate. The first amount of light ismore than the second amount of light. However, when the light blockinglayer is formed, a light leakage is prevented. The light blocking layermay be formed at both of the first and second side portions 245 a and245 b to prevent the light leakages that occur at the first and secondside portions 245 a and 245 b. The light blocking layer may be formedonly at the first side portion 245 a in order to increase an apertureratio.

For example, when the rubbing direction is from lower side to upper sideof FIG. 4, the light blocking pattern may be formed at the fourth sideportion 245 d of the transmissive region. Further, when the rubbingdirection is from the upper side to lower side of FIG. 4, the gate lines209 is broaden to the third side portion 245 c to form the lightblocking layer.

Further, when the rubbing direction corresponds to one or two o'clockdirection, a light blocking pattern may be formed at the first andfourth side portions 245 a and 245 d. When the rubbing directioncorresponds to 10 or 11 o'clock direction, a light blocking pattern maybe formed at the second and third side portions 245 b and 245 c.

In the present embodiment, an array substrate having a top ITOstructure, in which the pixel electrodes comprising indium tin oxide(ITO) is formed on the organic insulation layer, is employed in order toexplain the present embodiment. However, the present embodiment may beapplied to a bottom ITO structure, in which the pixel electrodes isformed under the organic insulation layer.

Further, the reflective layer is formed on the pixel electrode in thepresent embodiment. However, the pixel electrode may be formed on thereflective layer.

FIG. 5 is a cross-sectional view taken along a line A-A′ of FIG. 4. Alight blocking pattern is extended from the gate line to overlap withboth first and second side portions 245 a and 245 b.

Referring to FIG. 5, a transmissive and reflective type liquid crystaldisplay apparatus according to a first exemplary embodiment of thepresent invention includes an array substrate, a color filter substrate270 and a liquid crystal layer 280 interposed between the arraysubstrate and the color filter substrate 270.

The array substrate includes a thin film transistor TFT, a storagecapacitor CST and an organic insulation layer 242. The thin filmtransistor TFT includes a gate electrode 210, a semiconductor layer 214,an ohmic contact layer 216, a source electrode 218 and a drain electrode219. The gate electrode 210 is extended from a gate line 209 formed on atransparent substrate 205. A gate insulation layer 212 is formed on thegate electrode 210 and the transparent substrate 205.

The storage capacitor CST includes a first storage electrode line 220and a second storage electrode line 222. The first storage electrodeline 220 is formed on the transparent substrate 205, such that the firststorage electrode line 220 is spaced apart from the thin film transistorTFT. The second storage electrode line 222 is formed over the firststorage electrode line 220.

The organic insulation layer 242 is covers the thin film transistor TFTand the storage capacitor CST. A portion of the organic insulation layer242 is removed to expose a portion of the drain electrode 219. Aplurality of grooves or recesses may be formed on an upper surface ofthe organic insulation layer 242.

Additionally, the array substrate includes a light blocking pattern 230and a source line 217. The light blocking pattern 230 is extended fromthe gate line 209. The source line 217 is formed over the light blockingpattern 230. A length of the light blocking pattern 230 is larger than alength of the first side portion 245 a of a transmissive window, and awidth of the light blocking pattern 230 is larger than a width of thesource line 217.

The array substrate also includes a pixel electrode 250, an insulationlayer 252 and a reflective layer 260. The pixel electrode 250 iselectrically connected to the drain electrode 219 via a contact hole243. The insulation layer 252 covers the thin film transistor TFT. Thereflective layer 260 is formed on the insulation layer 252, and thereflective layer 260 reflects a light. Therefore, a region, where theorganic insulation layer 242 and the reflective layer 260 are formed,corresponds to a reflective region (or reflective window) 246, and aregion, where the organic insulation layer 242 is not formed,corresponds to a transmissive region (or transmissive window) 245.Therefore, the transmissive region 245 includes only the pixel electrode250 and the insulation layer 252, not the reflective layer 260. A widthof the light blocking pattern 230 is larger than a width of the sourceline 217. Therefore, the light blocking pattern 230 overlaps with thefirst and second side portions 245 a and 245 b of neighboringtransmissive windows, by a length ‘L’, respectively. That is, the lightblocking pattern 230 overlaps with first and second regions ‘A’ and ‘B’of FIG. 4 to prevent a light leakage that occurs at the first and secondregions ‘A’ and ‘B’.

The pixel electrode 250 comprises an optically transparent andelectrically conductive material, for example, such as indium tin oxide(ITO), tin oxide (TO), indium zinc oxide (IZO), etc.

In the present embodiment, the insulation layer 252 is interposedbetween the pixel electrode 250 and the reflective layer 260 toelectrically insulate the pixel electrode 250 from the reflective layer260. However, the reflective layer 260 may be formed on the pixelelectrode 250.

The color filter substrate 270 includes a black matrix (not shown), acolor filter layer 274 having R, G, B color filters and a protectionlayer (not shown). The black matrix defines R, G, B pixel regions. TheR, G, B color filters of the color filter layer 274 are formed in the R,G, B pixel regions, respectively. The protection layer protects theblack matrix and the color filter layer 274. The R, G, B color filtersmay overlap to form the black matrix instead of forming separate blackmatrix. A common electrode (not shown) may be formed on the protectionlayer.

The liquid crystal layer 280 transmits an ambient light or a light thathas passed through the transmissive window in accordance with a pixelvoltage applied to the pixel electrode 250 and a reference voltageapplied to the common electrode.

The liquid crystal layer 280 includes a first liquid crystal layer, asecond liquid crystal layer and a third liquid crystal layer. The firstliquid crystal layer corresponds to a liquid crystal layer 280 of thecontact hole 243 region, and the first liquid crystal layer has a firstcell gap d1. The second liquid crystal layer corresponds to a liquidcrystal layer 280 disposed over the organic insulation layer 242, andthe second liquid crystal layer has a second cell gap d2. The thirdliquid crystal layer corresponds to a liquid crystal layer 280 of thetransmissive window 245, and the third liquid crystal layer has a thirdcell gap d3. For example, the second cell gap d2 is no larger than thefirst cell gap d1, and the first cell gap d1 is no larger than the thirdcell gap d3 (d2≦d1≦d3).

Therefore, when Δn represents a refractivity anisotropy, and ‘d’represents a cell gap, the first liquid crystal layer is characterizedby Δnd1, the second liquid crystal layer is characterized by Δnd2, andthe third liquid crystal layer is characterized by Δnd3.

Optimal cell gap depends on an optical films disposed under or over theliquid crystal layer 280. However, generally, the second cell gap d2 isless than 1.7 μm, and the third cell gap d3 is less than 3.3 μm.

For example, a twist angle of the liquid crystal layer is about 0°.Thus, a rubbing direction of the array substrate is opposite to arubbing direction of the color filter substrate. That is, when a rubbingdirection of the array substrate turns toward right side as shown inFIG. 4, a gate line is diverged to form the light blocking pattern 230,such that the light blocking pattern 230 overlaps with the first sideportion 245 a of the transmissive window 245 through which light leaksmuch.

When the rubbing direction of the array substrate turns toward leftside, a gate line is diverged to form the light blocking pattern 230,such that the light blocking pattern 230 overlaps with the second sideportion 245 b of the transmissive window 245.

When the rubbing direction of the array substrate turns toward upperside, the light blocking pattern overlaps with the third side portion245 c. When the rubbing direction of the array substrate turns towardlower side, the light blocking pattern overlaps with the fourth sideportion 245 d. In order to form the light blocking pattern, the gateline may be diverged. However, a width of the gate line may be increasedto the fourth side portion 245 d to form the light blocking pattern.When the rubbing direction corresponds to two or three o'clockdirection, or ten or eleven o'clock direction, the gate line may bediverged to be overlapped with the first and fourth side portions 245 aand 245 d or second and third side portions 245 b and 245 c.

Hereinbefore, the pixel electrode 250 is formed on the array substrateand the common electrode is formed on the color filter substrate.However, the common electrode may be omitted by applying differentvoltage to the array substrate to transmit an ambient light or a lightgenerated from a backlight assembly.

FIGS. 6A to 6D are layouts showing a process of manufacturing thetransmissive and reflective type liquid crystal display apparatus ofFIG. 4.

Referring to FIG. 6A, metal, for example, such as tantalum (Ta),titanium (Ti), molybdenum (Mo), aluminum (Al), chromium (Cr), cupper(Cu), tungsten (W), etc. is deposited on a transparent substrate 205comprising glass or ceramic to form a metal layer. The metal layer ispatterned to form a plurality of gate lines 209, a gate electrode line210, a light blocking pattern 230 and a first storage electrode line220. The gate lines 209 are extended in a horizontal direction, andarranged in a vertical direction. The gate electrode line 210 isprotruded from the gate line 209. The light blocking pattern 230 isprotruded from the gate line 209 to prevent a light leakage. The storageelectrode line 220 is extended in a horizontal direction, so that thestorage electrode line 220 is in parallel with the gate electrode lines209.

Preferably, a width of the light blocking pattern 230 is larger than awidth of a source line that is to be formed, and a length of the lightblocking pattern 230 is larger than a length of a side portion of atransmissive window.

Then, silicon nitride is coated on the substrate having the gateelectrode line 210 is formed thereon to form a gate insulation layer.For example, the silicon nitride may be coated via chemical vapordeposition. An amorphous silicon layer and n+ amorphous silicon layerare formed and patterned to form a semiconductor layer 214 and ohmiccontact layer 216 in sequence. The gate insulation layer may be formedon entire surface of the substrate, or patterned to cover the gate lineand gate electrode line.

Referring to FIG. 6B, metal, for example, such as tantalum (Ta),titanium (Ti), molybdenum (Mo), aluminum (Al), chromium (Cr), cupper(Cu), tungsten (W), etc. is deposited on the semiconductor layer 214 toform a metal layer. Then, the metal layer is patterned to form aplurality of source lines 217, a source electrode line 218, a drainelectrode line 219, and a second storage electrode line 222. The sourcelines 217 are extended in the vertical direction, and arranged in thehorizontal direction. The source electrode line 218 is protruded fromthe source line 217. The drain electrode line 219 is spaced apart fromthe source electrode line 218. The second storage electrode line 222 isdisposed over the first storage electrode line 220. The first and secondstorage electrode lines 220 and 222 form a storage capacitor CST.

Referring to FIG. 6C, an organic insulation layer 242 is formed on thesemiconductor layer via spin coating method. A portion of the organicinsulation layer 242 is removed to form a contact hole 243 and atransmissive window 245. The contact hole 243 exposes the drainelectrode line 219. A side portion of the transmissive window 245 isdisposed over the light blocking pattern.

Referring to FIG. 6D, an indium tin oxide layer 250 is formed, such thatthe indium tin oxide layer 250 is electrically connected to the drainelectrode line 218 via the contact hole 243. The indium tin oxide layer250 is patterned to form a pixel electrode 250. The indium tin oxidelayer 250 may be formed entirely and patterned to form the pixelelectrode (hereinafter, a reference numeral 250 will be represents thepixel electrode) or the indium tin oxide layer may be formed on a regionof the pixel electrode 250. For example, the pixel electrode 250 isspaced apart from the source line 217, but the pixel electrode 250 mayoverlap with the source line 217.

Then, a reflective layer 260 is formed in a pixel region. The reflectivelayer 260 is not formed in the transmissive window 245. Then, analignment film (not shown) for aligning liquid crystal molecules in arubbing direction is formed.

For example, the reflective layer 260 is formed to define a reflectiveregion. However, the reflective layer 260 partitioned in accordance withthe pixel may be formed. That is, the reflective layer may be formed ona region excluding a portion of a center of the gate line, a portion ofa center of the source line and the transmissive region.

An embossing pattern for enhancing a reflectivity is formed on a surfaceof the organic insulation layer 242. However, a surface of the organicinsulation layer may be flat.

Hereinbefore, for example, a transmissive and reflective type liquidcrystal display apparatus having top ITO structure is explained.However, present invention may be applied to a transmissive andreflective type liquid crystal display apparatus having a bottom ITOstructure.

FIG. 7 is a plan view showing an array substrate of a transmissive andreflective type liquid crystal display apparatus according to a secondexemplary embodiment of the present invention.

Referring to FIG. 7, a transmissive and reflective type liquid crystaldisplay apparatus according to a second exemplary embodiment of thepresent invention includes a plurality of gate lines 209, a plurality ofsource lines 334, a thin film transistor TFT, a storage capacitor CST,first and second light blocking patterns 330 and 332, a pixel electrode250 and a reflective layer 260. In FIG. 7, the same reference numeralsdenote the same elements in FIG. 4, and thus the detailed descriptionsof the same elements will be omitted.

The first light blocking pattern 330 is spaced apart from the gate line209. Therefore, the first light blocking pattern corresponds to afloating wiring through which electric signal is not applied. The firstlight blocking pattern 330 is longer than a side portion of thetransmissive window, which is adjacent and parallel to the source line.A first end portion 330 a of the first light blocking pattern 330invades the transmissive window 345, so that the first end portion 330 aof the first light blocking pattern 330 overlaps with the first sideportion 345 a of the transmissive window 345. The first light blockingpattern 330 also overlaps with the source line 334.

The second light blocking pattern 332 is spaced apart from the gate line209, and the second light blocking pattern 332 is longer than a sideportion of the transmissive window that is adjacent and parallel to thesource line. A first end portion 332 a of the second light blockingpattern 332 invades a second side portion 345 b of the transmissivewindow that is adjacent to the transmissive window that overlaps withthe first light blocking pattern 330, so that the first end portion 332a of the transmissive window overlaps with the second side portion 345 bof the transmissive window 345. The second light blocking pattern 332also overlaps with the source line 334. Therefore, according to thepresent embodiment, two separate light blocking patterns are formed tocover the first and second end portions 345 a and 345 b, respectively.

For example, when a rubbing direction turns toward right side, a stronglight leakage is prevented by the first light blocking pattern 330, anda weak light leakage is prevented by the second light blocking pattern332. In order to increase an aperture ratio, the second light blockingpattern 332 may be omitted.

Hereinbefore, as an example, a transmissive and reflective type liquidcrystal display apparatus having a top ITO structure was explained.However, the present embodiment may be employed to a transmissive andreflective type liquid crystal display apparatus having a bottom ITOstructure.

FIG. 8 is a cross-sectional view taken along a line B-B′ of FIG. 7.Reference numeral

Referring to FIG. 8, a transmissive and reflective type liquid crystaldisplay apparatus includes an array substrate, a color filter substrate270 and a liquid crystal layer 280 interposed between the arraysubstrate and the color filter substrate 270. In FIG. 8, the samereference numerals denote the same elements in FIG. 5, and thus thedetailed descriptions of the same elements will be omitted.

The array substrate includes first and second light blocking patterns330 and 332, and a source line 334. The first and second light blockingpatterns 330 and 332 are formed via a process forming the gate line 209.A portion of the source line 334 overlaps with the first and secondlight blocking patterns 330 and 332.

The first light blocking pattern 330 is spaced apart from the gate line209, and the first light blocking pattern 330 is longer than a firstside portion 345 a of a first transmissive window 3451. The first lightblocking pattern 330 overlaps with the first side portion 345 a of thefirst transmissive window 3451 by a first length L1, and the secondlight blocking pattern 332 overlaps with the second side portion 345 bof the second transmissive window 3452 by a second length L2. Therefore,a strong light leakage occurring at a first boundary ‘A’ of an organicinsulation layer 242 disposed at the first side portion 345 a, and aweak light leakage occurring at a second boundary ‘B’ of an organicinsulation layer 242 disposed at the second side portion 345 b areprevented.

In the second embodiment, a transmissive and reflective type liquidcrystal display apparatus having a top ITO structure is explained forexample. However, the second embodiment may be employed to atransmissive and reflective type liquid crystal display apparatus havinga bottom type ITO structure.

Additionally, in the second embodiment, the reflective layer is formedon the pixel electrode. However, the pixel electrode may be formed onthe reflective layer.

FIGS. 9A to 9D are layouts showing a process of manufacturing thetransmissive and reflective type liquid crystal display apparatus ofFIG. 7.

Referring to FIG. 9A, metal, for example, such as tantalum (Ta),titanium (Ti), molybdenum (Mo), aluminum (Al), chromium (Cr), cupper(Cu), tungsten (W), etc. is deposited on a transparent substrate 205comprising glass or ceramic to form a metal layer. The metal layer ispatterned to form a plurality of gate lines 209, a gate electrode line210, first and second light blocking patterns 330 and 332, and a firststorage electrode line 220. The gate lines 209 are extended in ahorizontal direction, and arranged in a vertical direction. The gateelectrode line 210 is protruded from the gate line 209. The first andsecond light blocking patterns 330 and 332 are spaced apart from thegate line 209. The storage electrode line 220 is extended in ahorizontal direction, so that the storage electrode line 220 is inparallel with the gate electrode lines 209.

Preferably, a length of the first and second light blocking pattern 330and 332 is larger than a length of a side portion of a transmissivewindow.

Then, silicon nitride is coated on the substrate having the gateelectrode line 210 is formed thereon to form a gate insulation layer.For example, the silicon nitride may be coated via chemical vapordeposition. An amorphous silicon layer and n+ amorphous silicon layerare formed and patterned to form a semiconductor layer 214 and ohmiccontact layer 216 in sequence. The gate insulation layer may be formedon entire surface of the substrate, or patterned to cover the gate lineand gate electrode line.

Referring to FIG. 9B, metal, for example, such as tantalum (Ta),titanium (Ti), molybdenum (Mo), aluminum (Al), chromium (Cr), cupper(Cu), tungsten (W), etc. is deposited on the semiconductor layer 214 toform a metal layer. Then, the metal layer is patterned to form aplurality of source lines 334, a source electrode line 218, a drainelectrode line 219, and a second storage electrode line 222. The sourcelines 334 are extended in the vertical direction, and arranged in thehorizontal direction. The source electrode line 218 is protruded fromthe source line 334. The drain electrode line 219 is spaced apart fromthe source electrode line 218. The second storage electrode line 222 isdisposed over the first storage electrode line 220. The first and secondstorage electrode lines 220 and 222 form a storage capacitor CST.

Referring to FIG. 9C, an organic insulation layer 242 is formed on thesemiconductor layer via spin coating method. A portion of the organicinsulation layer 242 is removed to form a contact hole 243 and atransmissive window 345. The contact hole 243 exposes the drainelectrode line 219. A side portion of the transmissive window 345 isdisposed over the light blocking pattern.

Referring to FIG. 9D, an indium tin oxide layer 250 is formed, such thatthe indium tin oxide layer 250 is electrically connected to the drainelectrode line 218 via the contact hole 243. The indium tin oxide layer250 is patterned to form a pixel electrode 250. The indium tin oxidelayer 250 may be formed entirely and patterned to form the pixelelectrode (hereinafter, a reference numeral 250 will be represents thepixel electrode) or the indium tin oxide layer may be formed on a regionof the pixel electrode 250. For example, the pixel electrode 250 isspaced apart from the source line 217, but the pixel electrode 250 mayoverlap with the source line 217.

Then, a reflective layer 260 is formed in a pixel region. The reflectivelayer 260 is not formed in the transmissive window 245. Then, analignment film (not shown) for aligning liquid crystal molecules in arubbing direction is formed.

A reflective layer 260 is formed on the pixel electrode 250.Additionally, an alignment film (not shown) is formed on the reflectivelayer 260. Then, the array substrate is completed.

FIG. 10 is a plan view showing a transmissive and reflective type liquidcrystal display apparatus according to a third exemplary embodiment ofthe present invention.

Referring to FIG. 10, a liquid crystal display apparatus according to athird exemplary embodiment of the present invention includes a pluralityof gate electrode 209, a plurality of source line 434, a thin filmtransistor TFT, a storage capacitor CST, a light blocking pattern 430, apixel electrode 250 and a reflective layer 260 disposed in thereflective region. The reflective layer 260 defines reflective andtransmissive regions (or windows). In FIG. 10, the same referencenumerals denote the same elements in FIG. 4, and thus the detaileddescriptions of the same elements will be omitted.

The light blocking pattern 430 is formed via a process of forming thegate lines 209, such that the light blocking pattern 430 is longer thana side portion of the reflective windows that is adjacent to the sourcelines 434. Additionally, a first end portion 430 a of the light blockingpattern 430 invades the transmissive window 445, so that the lightblocking pattern 430 overlaps with a first side portion 445 a of thetransmissive window 445. The light blocking pattern 430 also overlapswith the source line 434.

Therefore, when the rubbing direction turns toward right side of FIG.10, the light blocking pattern 430 prevents a light leakage.

In case that the rubbing direction turns toward upper side of FIG. 10,the light blocking pattern is formed, such that the light blockingpattern overlaps with the lower side portion of the transmissive window445.

In case that the rubbing direction turns toward one or two o'clockdirection, the light blocking pattern is formed, such that the lightblocking pattern overlaps with the lower and left side of thetransmissive window 445.

In case that the rubbing direction turns toward ten or eleven o'clockdirection, the light blocking pattern is formed, such that the lightblocking pattern overlaps with the upper and right side of thetransmissive window 445.

In the present embodiment, an array substrate having a top ITOstructure, in which the pixel electrodes comprising indium tin oxide(ITO) is formed on the organic insulation layer, is employed in order toexplain the present embodiment. However, the present embodiment may beapplied to a bottom ITO structure, in which the pixel electrodes isformed under the organic insulation layer.

Further, the reflective layer is formed on the pixel electrode in thepresent embodiment. However, the pixel electrode may be formed on thereflective layer.

FIG. 11 is a cross-sectional view taken along a line C-C′ of FIG. 10.

Referring to FIG. 11, a transmissive and reflective type liquid crystaldisplay apparatus according to a third exemplary embodiment of thepresent invention includes an array substrate, a color filter substrate270 and a liquid crystal layer 280 interposed between the arraysubstrate and the color filter substrate 270. In FIG. 11, the samereference numerals denote the same elements in FIG. 5, and thus thedetailed descriptions of the same elements will be omitted.

The array substrate includes a light blocking pattern 430 and a sourceline 434. The light blocking pattern 430 is formed via a process offorming a gate line 209, such that the light blocking pattern 430 isspaced apart from the gate line 209 and the light blocking pattern 430is longer than a first side portion 445 a of the transmissive window445. The light blocking pattern 430 overlaps with the first side portion445 a of the transmissive window 445 by a length L. Therefore, a lightleakage occurring at a first boundary A is prevented.

FIGS. 12A to 12D are layouts showing a process of manufacturing thetransmissive and reflective type liquid crystal display apparatus ofFIG. 10.

Referring to FIG. 12A, metal, for example, such as tantalum (Ta),titanium (Ti), molybdenum (Mo), aluminum (Al), chromium (Cr), cupper(Cu), tungsten (W), etc. is deposited on a transparent substrate 205comprising glass or ceramic to form a metal layer. The metal layer ispatterned to form a plurality of gate lines 209, a gate electrode line210, a light blocking pattern 430 and a first storage electrode line220. The gate lines 209 are extended in a horizontal direction, andarranged in a vertical direction. The gate electrode line 210 isprotruded from the gate line 209. The light blocking pattern 430 isspaced apart from the gate line 209. The storage electrode line 220 isextended in a horizontal direction, so that the storage electrode line220 is in parallel with the gate electrode lines 209.

Preferably, a length of the light blocking pattern 230 is larger than alength of a side portion of a transmissive window.

Then, silicon nitride is coated on the substrate having the gateelectrode line 210 is formed thereon to form a gate insulation layer.For example, the silicon nitride may be coated via chemical vapordeposition. An amorphous silicon layer and n+ amorphous silicon layerare formed and patterned to form a semiconductor layer 214 and ohmiccontact layer 216 in sequence. The gate insulation layer may be formedon entire surface of the substrate, or patterned to cover the gate lineand gate electrode line.

Referring to FIG. 12B, metal, for example, such as tantalum (Ta),titanium (Ti), molybdenum (Mo), aluminum (Al), chromium (Cr), cupper(Cu), tungsten (W), etc. is deposited on the semiconductor layer 214 toform a metal layer. Then, the metal layer is patterned to form aplurality of source lines 434, a source electrode line 218, a drainelectrode line 219, and a second storage electrode line 222. The sourcelines 434 are extended in the vertical direction, and arranged in thehorizontal direction. The source electrode line 218 is protruded fromthe source line 434. The drain electrode line 219 is spaced apart fromthe source electrode line 218. The second storage electrode line 222 isdisposed over the first storage electrode line 220. The first and secondstorage electrode lines 220 and 222 form a storage capacitor CST.

Referring to FIG. 12C, an organic insulation layer 242 is formed on thesemiconductor layer via spin coating method. A portion of the organicinsulation layer 242 is removed to form a contact hole 243 and atransmissive window 445. The contact hole 243 exposes the drainelectrode line 219. A side portion of the transmissive window 245 isdisposed over the light blocking pattern.

Referring to FIG. 12D, an indium tin oxide layer 250 is formed, suchthat the indium tin oxide layer 250 is electrically connected to thedrain electrode line 218 via the contact hole 243. The indium tin oxidelayer 250 is patterned to form a pixel electrode 250. The indium tinoxide layer 250 may be formed entirely and patterned to form the pixelelectrode (hereinafter, a reference numeral 250 will be represents thepixel electrode) or the indium tin oxide layer may be formed on a regionof the pixel electrode 250. For example, the pixel electrode 250 isspaced apart from the source line 217, but the pixel electrode 250 mayoverlap with the source line 217.

Then, a reflective layer 260 is formed in a pixel region. The reflectivelayer 260 is not formed in the transmissive window 245. Then, analignment film (not shown) for aligning liquid crystal molecules in arubbing direction is formed.

Hereinbefore, the light blocking pattern protruded from the gate line orspaced apart from the gate line, which corresponding to a boundary ofthe transmissive and reflective regions, prevents a light leakage.However, except for the gate line, a separate floating wiring may formthe light blocking pattern.

For example, when a plurality of gate lines and a plurality of datalines are formed on a first surface of the substrate, a floating linecorresponding to the boundary region may be formed on a second surfaceof the substrate.

The light leakage above described is caused by an abnormal arrangementof liquid crystal molecules. Therefore, the light leakage may be reducedby reducing a pretilt angle with respect to the substrate.

Hereinafter, an array substrate for reducing the pretilt angle withrespect to the substrate will be explained.

FIG. 13 is a plan view showing a transmissive and reflective type liquidcrystal display apparatus according to a fourth exemplary embodiment ofthe present invention.

Referring to FIG. 13, a liquid crystal display apparatus according to afourth exemplary embodiment of the present invention includes aplurality of gate lines 209, a plurality of source lines 334, a thinfilm transistor TFT, a storage capacitor CST, first and second lightblocking patterns 330 and 332, a pixel electrode 250 and a reflectivelayer 260 defining reflective and transmissive regions (or windows). InFIG. 13, the same reference numerals denote the same elements in FIG. 7,and thus the detailed descriptions of the same elements will be omitted.

The reflective layer 260 is formed in the reflective region, whichreflects an ambient light. A light generated from a backlight assemblyis transmitted through the transmissive region. The light generated fromthe backlight assembly passes through a gate insulation layer exposed byremoving a portion of an organic insulation layer. The reflective layer260 is not formed in the transmissive region, so that the reflectivelayer 260 does not block the light generated from the backlightassembly. Therefore, the transmissive region corresponds to a regionwhere the reflective layer 260 is not formed, and the reflective regioncorresponds to a region where the reflective layer 260 is formed.

An inclination angle of a first inclined portion that is disposedbetween the reflective region and the transmissive region in thatsequence along the rubbing direction is smaller than an inclinationangle of a second inclined portion that is disposed between thetransmissive region and the reflective region in that sequence along therubbing direction with respect to the substrate. Therefore, liquidcrystal molecules of the first inclined portion, where light leakageoccurs much, resemble liquid crystal molecules of a flat region, leadingto reduce the light leakage.

For example, when an alignment film is rubbed along the rubbingdirection Rd as shown in FIG. 13, a light leakage of the first sideportion 545 a of the transmissive window 545 is more severe than a lightleakage of the second side portion 545 b of the transmissive window 545.However, according to the present embodiment, the inclination angle ofthe first inclined portion that corresponds to the first side portion545 a is reduced with respect to the substrate, so that the lightleakage is reduced. Additionally, the first light blocking pattern 330prevents the light leakage.

Furthermore, the second light blocking pattern 332 corresponding to thesecond side portion 545 b prevents a weak light leakage. The first andsecond light blocking patterns 330 and 332 may be omitted, or only thesecond light blocking pattern 330 and 332 may be omitted in order toincrease an aperture ratio.

FIG. 14 is a cross-sectional view taken along a line D-D′ of FIG. 13.

Referring to FIG. 14, a transmissive and reflective type liquid crystaldisplay apparatus includes an array substrate, a color filter substrate270 and a liquid crystal layer interposed between the array substrateand the color filter substrate 270. In FIG. 14, the same referencenumerals denote the same elements in FIG. 8, and thus the detaileddescriptions of the same elements will be omitted.

The array substrate includes first and second light blocking patterns330 and 332, and a source line 334. The first and second light blockingpatterns 330 and 332 are formed via a process of forming a gate line209.

The first light blocking pattern 330 is spaced apart from the gate line209, and the first light blocking pattern 330 is longer than a firstside portion 545 a of a first transmissive window 5451. The first lightblocking pattern 330 is widened, so that the first light blockingpattern 330 overlaps with the first side portion 545 a of the firsttransmissive window 5451 by a predetermined length ‘I’. The second lightblocking pattern 332 is spaced apart from the gate line 209, and thesecond light blocking pattern 332 is longer than a second side portion5456 b of a second transmissive window 5452 that is adjacent to thefirst transmissive window 5451. The second light blocking pattern 332 iswidened, so that the second light blocking pattern 332 overlaps with thesecond side portion 545 b. Therefore, the first light blocking pattern330 prevents a strong light leakage occurring at the first boundary ‘A’of the organic insulation layer 242, which is disposed at the first sideportion 545 a. Additionally, the second light blocking pattern 332prevents a weak light leakage occurring at the second boundary ‘B’ ofthe organic insulation layer 242, which is disposed at the second sideportion 545 b.

Furthermore, a partial exposure is performed at an upper region ‘I’ ofthe first boundary ‘A’, and both partial exposure and slit exposure areperformed at a lower region ‘II’, so that the inclination angle of thefirst boundary ‘A’ becomes smaller than the inclination angle of thesecond boundary ‘B’. Therefore, an abnormal arrangement is relieved toreduce a light leakage.

In the present embodiment, an array substrate having a top ITOstructure, in which the pixel electrodes comprising indium tin oxide(ITO) is formed on the organic insulation layer, is employed in order toexplain the present embodiment. However, the present embodiment may beapplied to a bottom ITO structure, in which the pixel electrodes isformed under the organic insulation layer.

Furthermore, in the present embodiment, the reflective layer is formedon the pixel electrode. However, the pixel electrode may be formed onthe reflective layer.

According to the present invention, a light blocking pattern is formedin a boundary of the transmissive region and the reflective region toprevent a light leakage occurring at the boundary.

Further, an inclination angle of a first inclined portion that isdisposed between the reflective region and the transmissive region inthat sequence along the rubbing direction is smaller than an inclinationangle of a second inclined portion that is disposed between thetransmissive region and the reflective region in that sequence along therubbing direction with respect to the substrate. Therefore, a pretiltangle of liquid crystal molecules of the first inclined portion islarger than a pretilt angle of liquid crystal molecules of the secondinclined portion to reduce a light leakage occurring at the firstinclined portion.

Having described the exemplary embodiments of the present invention andits advantages, it is noted that various changes, substitutions andalterations can be made herein without departing from the spirit andscope of the invention as defined by appended claims.

1. An array substrate comprising: a transparent substrate including areflective window that reflects an ambient light and a transmissivewindow that transmits an artificial light; an organic insulation layerdisposed over the transparent substrate, the organic insulation layerbeing thinner gradually at a boundary between the transmissive windowand the reflective window; a pixel electrode formed in the transmissiveregion; a reflective layer disposed over the organic insulation layer ofthe reflective window; a light blocking pattern disposed at the boundarybetween the transmissive window and the reflective window to prevent alight leakage, a switching part that is electrically connected to a gateline, a source line and the pixel electrode to apply an image signal tothe pixel electrode, an alignment film rubbed along a rubbing direction;a first boundary between the reflective window and the transmissivewindow disposed in that sequence along the rubbing direction; a secondboundary between the transmissive window and the reflective windowdisposed in that sequence along the rubbing direction; wherein the lightblocking pattern is spaced apart from the gate line and disposed at onlythe first boundary to prevent a light leakage, the light blockingpattern is longer than a side portion of the transmissive window, andthe light blocking pattern overlaps with the side portion of thetransmissive window by a first length, and the second boundary isinclined steeper than the first boundary.
 2. The array substrate ofclaim 1, wherein the first length is no less than an orthogonalprojection of the first boundary.